Plasma cleaning machine
Applications include wafer cleaning in semiconductor and integrated circuit manufacturing, lithium battery manufacturing and photovoltaics in the new energy industry, medical devices, aerospace and optics, etc.
Vacuum system
Simultaneous processing of 5 flow channels and chambers
Servo automatic feeding system
Automatic film loading system
Ion surface treatment system
Faster switching time, shorter CT, and improved UPH
It can be compatible with multiple products at the same time without adjusting the track.
Reduce energy costs by using low-energy, high-performance electrical components.
Process
As thin as 0.1mm
Product thickness
±0.02mm
Repeatability (mm)
<15S
CT time (s)
Vacuum system
Simultaneous processing of 5 flow channels and chambers
Simultaneous processing of 5 flow channels and chambers
Servo automatic feeding system
Automatic film loading system
Automatic film loading system
Ion surface treatment system; fast switching time, shorter CT, and improved UPH.
It can be compatible with multiple products at the same time without adjusting the track.
Reduce energy costs by using low-energy, high-performance electrical components.
Product Inquiry
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